Description

Polishing sponge for Dual Action polisher. Firm Compounding Pads For Machine Polishing. For heavy paint correction jobs including removal of 1500 grit sanding marks, random deep scratches (RDS) and severe defects, Nanolex Hard Polishing Pads provide great results quickly.

The reticulated (open) cell structure of these pads allows superior flexibility, ideal for correction work on contoured areas where the pad needs to conform to the shape of the surface. This structure also lends additional strength to the pads, making them more resistant to tearing and rendering them increased durability. This makes them ideal for professional detailers for whom pad longevity is a consideration. For best results, use in conjunction with Nanolex Heavy Cut Polish.